Facilities
Nanoimprint Lithography (NIL) System
An Eitre 3 NIL System (Obducat, Sweden) hosted in a class 100 soft-wall clean room closure.Ìý
The equipment provides thermal embossing and step-and-flash nanoimprint, both independently and simultaneously.
The equipment provides precisely controlled temperature and pressure, with extremely uniform residual layer with pattern size down to 10 nm.Ìý
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Atomic Force Microscope (AFM)
Ìý ÌýNanoscope IV SPM from Bruker.Ìý This system is based on Veeco’s SPM model Dimension 3100.
Ìý ÌýEquipped with both open-loop and close-loop heads.
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Nanoscale Thermal Analysis (Nano-TA)
ÌýAnasys Nano-TA 2 system (now Bruker)Ìý Ìý ÌýÌý
Coupled with the AFM equipment.Ìý
Provide measurements of Tg or TmÌýwith nanoscale resolution (up to 450 oC)Ìý Ìý Ìý ÌýÌý
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Dynamic Mechanical Analysis (DMA)
TA Instrument, Q800 model
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Rheometer
TA Instrument, AR-G2 Model
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Differential Scanning Calorimetry (DSC):ÌýÌýDSC 204 F1 NETZSCH, Germany
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Collimated UV curing system
Ìý Ìý6986 EXFO OMNICURE S2000 UV CURE
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Microscope Hot Stage
Instec STC 200 model
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Membrane Filtration Capabilities
Our labÌýhas extensive filtration equipment and facilities for membrane research, including:
- Varies of bench scale, stirred dead-end filtraiton cells with pressure up to 1000 psi
- Liquid cells suitable for both diffusion and pressure-driven crossflow or normal flow up to 400 psiÌý
- Low (up to 200 psi) and high (1000 psi) pressure bench scale crossflow membrane units
- Direct contact membrane distillation (DCMD) setup
- Gas permeation measurement setup for common gases